Semiconductor Constructions, Methods of Forming Vertical Memory Strings, and Methods of Forming Vertically-Stacked Structures

ABSTRACT

Some embodiments include methods of forming vertical memory strings. A trench is formed to extend through a stack of alternating electrically conductive levels and electrically insulative levels. An electrically insulative panel is formed within the trench. Some sections of the panel are removed to form openings. Each opening has a first pair of opposing sides along the stack, and has a second pair of opposing sides along remaining sections of the panel. Cavities are formed to extend into the electrically conductive levels along the first pair of opposing sides of the openings. Charge blocking material and charge-storage material is formed within the cavities. Channel material is formed within the openings and is spaced from the charge-storage material by gate dielectric material. Some embodiments include semiconductor constructions, and some embodiments include methods of forming vertically-stacked structures.

TECHNICAL FIELD

Semiconductor constructions, methods of forming vertical memory strings,and methods of forming vertically-stacked structures.

BACKGROUND

Memory provides data storage for electronic systems. Flash memory is onetype of memory, and has numerous uses in modern computers and devices.For instance, modern personal computers may have BIOS stored on a flashmemory chip. As another example, it is becoming increasingly common forcomputers and other devices to utilize flash memory in solid statedrives to replace conventional hard drives. As yet another example,flash memory is popular in wireless electronic devices because itenables manufacturers to support new communication protocols as theybecome standardized, and to provide the ability to remotely upgrade thedevices for enhanced features.

A typical flash memory comprises a memory array that includes a largenumber of memory cells arranged in row and column fashion. The flashmemory may be erased and reprogrammed in blocks.

NAND may be a basic architecture of flash memory. A NAND stringcomprises at least one selecting device coupled in series to a serialcombination of memory cells. Example NAND architecture is described inU.S. Pat. No. 7,898,850.

There is continuing goal to develop improved NAND architectures, and todevelop methods of forming such NAND architectures.

BRIEF DESCRIPTION OF THE DRAWINGS

FIGS. 1, 4, 7, 10, 13, 16, 19, 22 and 25 are top views of a portion of asemiconductor construction at various process stages of an exampleembodiment method of forming vertical memory strings.

FIGS. 2, 5, 8, 11, 14, 17, 20, 23 and 26 are diagrammaticcross-sectional views along the lines X-X of FIGS. 1, 4, 7, 10, 13, 16,19, 22 and 25, respectively; and FIGS. 3, 6, 9, 12, 15, 18, 21, 24 and27 are diagrammatic cross-sectional views along the lines Y-Y of FIGS.1, 4, 7, 10, 13, 16, 19, 22 and 25, respectively.

FIG. 28 is a diagrammatic view of a fragment along the lines A-A ofFIGS. 26 and 27 illustrating an example embodiment.

FIG. 29 is a diagrammatic view of a fragment along the lines A-A ofFIGS. 26 and 27 illustrating an example embodiment alternative to thatof FIG. 28.

FIGS. 30 and 31 are diagrammatic cross-sectional views along the linesX-X and Y-Y respectively of FIG. 25 illustrating an example embodimentalternative to that of FIGS. 26 and 27; and FIG. 32 is a diagrammaticview of a fragment along the lines A-A of FIGS. 30 and 31 illustratingan example embodiment.

FIGS. 33-36 are top views of a portion of a semiconductor constructionat various process stages of another example embodiment method offorming vertical memory strings.

DETAILED DESCRIPTION OF THE ILLUSTRATED EMBODIMENTS

In some embodiments, new processing is utilized to formvertically-stacked structures, such as, for example, vertically-stackedgates of vertical memory strings (e.g., NAND strings). Some exampleembodiments are described with reference to FIGS. 1-36.

Referring to FIGS. 1-3, a semiconductor construction 10 includes anetchstop material 14 supported by a base 12. A break is provided betweenthe etchstop material 14 and the base 12 to indicate that there may beadditional materials and/or integrated circuit structures between thebase and the etchstop material in some embodiments.

The base 12 may comprise semiconductor material, and in some embodimentsmay comprise, consist essentially of or consist of monocrystallinesilicon. In some embodiments, base 12 may be considered to comprise asemiconductor substrate. The term “semiconductor substrate” means anyconstruction comprising semiconductive material, including, but notlimited to, bulk semiconductive materials such as a semiconductive wafer(either alone or in assemblies comprising other materials), andsemiconductive material layers (either alone or in assemblies comprisingother materials). The term “substrate” refers to any supportingstructure, including, but not limited to, the semiconductor substratesdescribed above. In some embodiments, base 12 may correspond to asemiconductor substrate containing one or more materials associated withintegrated circuit fabrication. Such materials may include, for example,one or more of refractory metal materials, barrier materials, diffusionmaterials, insulator materials, etc.

The etchstop material 14 may comprise any suitable composition orcombination of compositions; and in some embodiments may comprise,consist essentially of, or consist of aluminum oxide or tungstensilicide.

A stack 16 of alternating electrically conductive levels 18 andelectrically insulative levels 20 is formed over the etchstop material14. The levels 18 and 20 may be of any suitable configuration;including, for example, sheets, layers, etc.

The electrically conductive levels 18 may comprise any suitableelectrically conductive material; and in some embodiments may comprise,consist essentially of, or consist of one or more of various metals (forexample, tungsten, titanium, etc.), metal-containing compositions (forexample, metal nitride, metal carbide, metal silicide, etc.), andconductively-doped semiconductor materials (for example,conductively-doped silicon, conductively-doped germanium, etc.). Forinstance, in some embodiments the electrically conductive levels 18 maycomprise, consist essentially of, or consist of conductively-dopedsilicon; such as, for example, n-type doped polycrystalline silicon.

In some embodiments, the electrically conductive levels 18 comprisecontrol gate material, and are ultimately patterned into control gatesof flash devices. Such example processing may form vertical memorystrings, with the number of memory cells in each string being determinedby the number of electrically conductive levels 18. A break is providedwithin the stack 16 to indicate that there may be more levels in thestack than are shown. The stack may have any number of levels suitableto form a desired structure. For instance, in some embodiments the stackmay have 8 electrically conductive levels, 16 electrically conductivelevels, 32 electrically conductive levels, 36 electrically conductivelevels, 64 electrically conductive levels, 72 electrically conductivelevels, etc.

The electrically insulative levels 20 may comprise any suitablecomposition; and in some embodiments may comprise, consist essentiallyof or consist of silicon dioxide.

The electrically conductive levels 18 may be of any suitable thickness(T₁), and in some embodiments may have a thickness within a range offrom about 5 nm to about 300 nm; such as, for example, a thickness ofabout 30 nm. The electrically insulative levels 20 may be of anysuitable thickness (T₂), and in some embodiments may have a thicknesswithin a range of from about 5 nm to about 200 nm; such as, for example,a thickness of about 20 nm.

In the shown embodiment, the base 12 has a substantially horizontalprimary surface 13. In some embodiments, subsequent processing(described below) may be utilized to form a memory string which extendsalong a vertical direction; or in other words, which extends along adirection which is substantially orthogonal to that of the horizontalprimary surface 13.

A hardmask material 22 is formed over stack 16. The hardmask material 22may comprise any suitable composition or combination of compositions;and in some embodiments may comprise, consist essentially of or consistof silicon nitride.

Referring to FIGS. 4-6, trenches 24-27 are formed to extend through thestack 16 to the etchstop material 14. The trenches may be formed withany suitable processing. For instance, in some embodiments a patternedmasking material (not shown) may be formed over the hardmask material 22to define locations of the trenches 24-27, a pattern from the maskingmaterial may be transferred into hardmask material 22 with one or moresuitable etches, and then the pattern may be transferred from thehardmask material into stack 16 with one or more suitable etches. Thepatterned masking material may be removed at some point subsequent tothe patterning of hardmask material 22. The masking material maycomprise any suitable composition, and in some embodiments may comprisea photolithographically-patterned photoresist mask and/or a mask formedutilizing pitch-multiplication methodologies. In some embodiments, othermaterials (not shown) may be provided between a patterned maskingmaterial and the hardmask material 22. For instance, if the maskingmaterial comprises photolithographically-patterned photoresist, anantireflective material (not shown) and a carbon-containing material(not shown) may be provided between the hardmask material 22 and thephotoresist. Such materials may be removed during or after formation ofthe trenches within stack 16 to leave the construction shown in FIGS.4-6.

In the shown embodiment of FIGS. 4-6, trenches 24-27 are linear trencheswhich are substantially parallel to one another. The term “substantiallyparallel” means that the trenches are parallel to within reasonabletolerances of fabrication and measurement. Although the linear trenchesof FIGS. 4-6 are shown to be separate from one another, in otherembodiments (such as, for example, an embodiment described below withreference to FIGS. 33-36) a single serpentining trench may be formedwhich encompasses linear regions at the locations of trenches 24-27.

Referring to FIGS. 7-9, electrically insulative fill material 28 isprovided within trenches 24-27 (FIGS. 4-6) to form electricallyinsulative panels 30-33 within such trenches. The fill material maycomprise any suitable composition or combination of compositions; and insome embodiments may comprise, consist essentially of or consist of anelectrical insulative oxide, such as, for example, silicon dioxide. Thefill material may be formed by any suitable processing, including, forexample, atomic layer deposition (ALD), chemical vapor deposition (CVD),and/or physical vapor deposition (PVD). In the shown embodiment, aplanarized surface 35 extends across fill material 28 and hardmask 22.Such planarized surface may be formed by any suitable processing. Forinstance, in some embodiments the fill material 28 may be formed tooverfill the trenches 24-27 (FIGS. 4-6), and subsequentlychemical-mechanical polishing (CMP) may be utilized to form theplanarized surface 35.

In the shown embodiment, the panels 30-33 are rectangularly-shaped. Eachpanel has a pair of opposing sides 37 and 39 (shown relative to panel31) which are adjacent to stack 16. The illustrated panels also have apair of opposing ends 41 and 43 (shown relative to panel 31) which arealso adjacent to the stack 16.

The panels 30-33 of FIGS. 7-9 are linear structures which aresubstantially parallel to one another. Although the panels of FIGS. 4-6are shown to be separate from one another, in other embodiments (suchas, for example, an embodiment described below with reference to FIGS.33-36) a single serpentining panel may be formed which encompasseslinear regions at the locations of panels 30-33.

Referring to FIGS. 10-12, openings 50-55 are formed through panels30-33. The openings may be formed utilizing any suitable processing. Forinstance, in some embodiments a patterned masking material (not shown)may be formed over the material 28 to define locations of the openings50-55, and then a pattern may be transferred from the masking materialand into material 28 with one or more suitable etches. The patternedmasking material may then be removed to leave the construction of FIGS.10-12. The masking material may comprise any suitable composition, andin some embodiments may comprise a photolithographically-patternedphotoresist mask and/or a mask formed utilizing pitch-multiplicationmethodologies. In some embodiments, other materials (not shown) may beprovided between a patterned masking material and the material 28. Forinstance, if the masking material comprisesphotolithographically-patterned photoresist, an antireflective material(not shown) and a carbon-containing material (not shown) may be providedbetween the photoresist and the material 28. Such antireflectivematerial and/or carbon-containing material may be removed during orafter formation of the openings 50-55 to leave the construction shown inFIGS. 10-12.

The formation of openings 50-55 may be considered to result from theremoval of some sections of panels 30-33. Other sections of the panelsremain; and for example panel 31 is shown to comprise sections 56 and 57remaining on opposing sides of opening 52. In some embodiments, each ofthe openings 50-55 may be considered to have a first pair of opposingsides along stack 16, and a second pair of opposing sides alongremaining sections of the panels 30-33. For instance, opening 52 isshown to comprise a first pair of opposing sides 59 and 61 along stack16, and to comprise a second pair of opposing sides 63 and 65 along theremaining sections 56 and 57 of panel 31.

The openings 50-55 may have any suitable shape. Although the openingsare square in the top view of FIG. 10, in other embodiments the openingsmay have other shapes. For instance, in some embodiments the openingsmay be circular or elliptical when viewed in a top view analogous tothat of FIG. 10.

In the shown embodiment, the sides of openings 50-55 are substantiallyvertical. In actual processing, such sidewalls may be tapered.

Referring to FIGS. 13-15, the electrically conductive levels 18 areetched along sidewalls of openings 50-55 to form cavities 60 (only someof which are labeled) extending into the conductive levels.

In some embodiments, the electrically conductive levels 18 comprisepolycrystalline silicon, the electrically insulative levels 20 andelectrically insulative material 28 comprise silicon dioxide, and theformation of cavities 60 utilizes isotropic etching which issubstantially selective for polycrystalline silicon relative to silicondioxide.

The electrically conductive levels 18 have exposed edges 62 (only someof which are labeled) within the cavities 60.

Referring to FIGS. 16-18, first charge blocking material 64 (only someof which is labeled) is formed along the exposed edges 62 (FIGS. 13-15)of conductive levels 18 within cavities 60 (FIGS. 13-15). The firstcharge blocking material 64 may be electrically insulative, and maycomprise any suitable composition. In some embodiments, material 64 maycomprise, consist essentially of, or consist of silicon dioxide formedby oxidation of exposed edges of silicon-containing material 18.

Second charge blocking material 66 is formed within openings 50-55 andalong the first charge blocking material 64. The second charge blockingmaterial may be electrically insulative, and may comprise any suitablecomposition. In some embodiments, material 66 may comprise, consistessentially of, or consist of silicon nitride. The second chargeblocking material is formed conformally along sidewalls of openings50-55, and accordingly extends within the cavities 60 (FIGS. 13-15). Thesecond charge blocking material may be formed by any suitable process,including, for example, ALD.

The second charge blocking material within cavities 60 (FIGS. 13 and 15)extends along tops and bottoms of the cavities (as shown in FIG. 17),and also extends along the first charge blocking material 64 at recessededges of the cavities.

Sacrificial material 68 (only some of which is labeled) is formed withinthe cavities 60 (FIGS. 13-15) and over the second charge blockingmaterial 66. The sacrificial material 68 may be formed with any suitablemethod. For instance, the sacrificial material 68 may be formed by oneor more of ALD, CVD and PVD. The sacrificial material 68 may be formedto a suitable thickness to overfill the cavities, and then an etch maybe utilized to remove excess sacrificial material and thereby leave thesacrificial material primarily within the cavities.

The sacrificial material 68 may comprise any suitable composition. Insome embodiments, the sacrificial material may be a carbon-containingmaterial.

Referring to FIGS. 19-21, an etch is utilized to remove exposed regionsof material 66 from above and below sacrificial material 68 withincavities 60 (the cavities are labeled in FIG. 14), while the sacrificialmaterial protects portions of material 66 at the backs of the cavities.The etch may be any suitable etch for selectively removing material 66relative to material 68. In some embodiments, both the charge blockingmaterial 66 and hardmask material 22 comprise silicon nitride, and insuch embodiments some etching of the hardmask material may occur duringthe etching of material 66.

Referring to FIGS. 22-24, sacrificial material 68 (FIGS. 19-21) isremoved. Such removal may utilize any suitable processing. For instance,if the sacrificial material is a carbon-containing material, removal ofthe sacrificial material may comprise oxidation of suchcarbon-containing material.

A third charge blocking material 70 (only some of which is labeled) isformed along the second charge blocking 68 (only some of which islabeled). The material 70 may be electrically insulative. Material 70may be formed utilizing any suitable processing, including, for example,one or more of ALD, CVD and PVD; and/or oxidation of an exposed surfaceof material 66. In some embodiments, the charge blocking materials 64,66 and 70 may comprise silicon dioxide, silicon nitride and silicondioxide, respectively. In such embodiments, such materials may beconsidered to form a silicon nitride structure (the structure comprisingmaterial 66) sandwiched between a pair of silicon dioxide structures(the structures comprising materials 64 and 70). All of such structuresare planar in the shown embodiment, and specifically are planar verticalstructures extending along planar vertical edges 62 (only some of whichare labeled) of conductive levels 18. In other embodiments (not shown)one or more of materials 64, 66 and 70 may extend along top and bottomsurfaces of the cavities 60 (the cavities are labeled in FIG. 14), andaccordingly one or more of the structures comprising such materials maynot be planar. For instance, in some embodiments the sacrificialmaterial 68 (FIGS. 17 and 20) may be omitted, and thus the chargeblocking material 66 may remain along top and bottom surfaces of thecavities, rather than being processed into the illustrated planarstructure of FIG. 23.

Charge-storage material 72 (only some of which is labeled) is formedwithin the cavities 60 (the cavities are labeled in FIG. 14). Thecharge-storage material 72 may comprise any suitable composition; andmay, for example, comprise floating gate material (for instance,polycrystalline silicon) or charge-trapping material (for instance,silicon nitride, nanodots, etc.). In some embodiments, thecharge-storage material may be electrically conductive material.

An advantage of utilizing charge blocking materials 64, 66 and 70configured as planar structures is that the charge-storage material 72has a same thickness along the cross-section of FIG. 23 as the controlgate material of levels 18. Ultimately, memory cells 74 (only some ofwhich are labeled) are formed to comprise the control gate material,charge-trapping material, and charge blocking material between thecontrol gate material and charge-trapping material. It can beadvantageous that the control gate material and charge-trapping materialhave a common thickness as one another within such memory cells toimprove electrical coupling between the control gate material andcharge-trapping material relative to other constructions havingdifferent relative thicknesses between the control gate material and thecharge-trapping material. The improved electrical coupling may lead toimproved operational characteristics, such as, for example, improvedretention and/or improved switching.

The charge-storage material may be formed in the shown configurationwith any suitable processing. For instance, the charge storage materialmay be initially provided to a thickness which overfills the cavities,and then subjected to an etch which removes excess charge-storagematerial to leave the charge-storage material only within the cavities.

Although three charge blocking materials (64, 66 and 70) are shownformed between the control gate material of levels 18 and thecharge-storage material 72, in other embodiments there may be more thanthree charge blocking materials, or less than three charge blockingmaterials. Generally, there will be at least one charge blockingmaterial. The charge blocking material may comprise any suitablecomposition or combination of compositions; including, for example, oneor more of silicon nitride, silicon dioxide, hafnium oxide, zirconiumoxide, etc.

Referring to FIGS. 25-27, the openings 50-55 are extended throughmaterial 14, gate dielectric material 76 is formed within the openings50-55 to line the openings, and then channel material 78 is formedwithin openings 50-55 and along the gate dielectric material.

The gate dielectric material may comprise any suitable composition orcombination of compositions; and in some embodiments may comprise,consist essentially of, or consist of one or more of silicon dioxide,hafnium oxide, zirconium oxide, aluminum oxide, etc. In the shownembodiment, the gate dielectric material lines sidewalls of openings50-55, and accordingly may be considered to be configured as gatedielectric liners within such openings. In other embodiments, the gatedielectric material may be selectively formed only along surfaces ofcharge-storage material 72 by, for example, oxidizing such surfaces. Inthe shown embodiment, the gate dielectric material 76 is between thechannel material 78 and the electrically insulative material 28. Inother embodiments in which the gate dielectric material is formed byoxidizing surfaces of charge-storage material 72, such gate dielectricmaterial may not be between the channel material 78 and the electricallyinsulative material 28. In such other embodiments, the channel material78 may be directly against electrically insulative material 28 at aprocessing stage analogous to that of FIGS. 25-27.

The channel material 78 may comprise any suitable composition, orcombination of compositions, and in some embodiments may comprise,consist essentially of, or consist of appropriately-doped silicon (e.g.,conductively-doped polycrystalline silicon).

The memory cells 74 (only some of which is labeled) are along thechannel material. In operation, vertically-stacked memory cells 74 maybe incorporated into vertical NAND strings. Such vertical NAND stringsmay include select gates (for instance, drain side select gates andsource side select gates) which are provided above and below thevertically-stacked memory cells (the select gates are not shown). Insome embodiments, a plurality of vertical NAND strings may be formedacross a semiconductor substrate to form a NAND memory array.

In some embodiments, the construction 10 of FIGS. 25-27 may beconsidered to be a NAND construction having material 28 configured aselectrically insulative pillars 80 extending through the stack 16. Theconstruction further comprises channel material 78 configured as channelmaterial posts 82 extending through the stack 16, with the channelmaterial posts being between the electrically insulative pillars 80.Each of the posts may be considered to comprise a first pair of opposingsides 81 and 83 (shown relative to a post within opening 52, and asecond pair of opposing sides 85 and 87 (also shown relative to the postwithin opening 52).

The individual sides of the first pair of opposing sides are spaced fromadjacent pillars 80 by intervening regions of stack 16 (shown in FIG.26, where intervening regions of the stack are labeled as a region 91between side 81 and one of the pillars 80, and a region 93 between side83 and another of the pillars 80).

Each of the sides of the second pair of opposing sides 85 and 87 doesnot have any of the materials of stack 16 between it and the adjacentpillars 80, as can be seen in FIG. 27.

The cavities 60 (labeled in FIG. 14) extend into the electricallyconductive levels along the first pair of opposing sides 81 and 83 ofthe channel material posts. The charge blocking materials 64, 66 and 70(only some of which are labeled in FIG. 26) are along edges of theelectrically conductive levels within the cavities, and thecharge-storage material 72 (only some of which is labeled in FIG. 26) iswithin the cavities and spaced from the electrically conductive levelsby the charge blocking materials. The gate dielectric 76 is between thecharge-storage material 72 and the channel material posts 82.

FIG. 28 shows a view of a fragment along the lines A-A of FIGS. 26 and27 to illustrate that in some example embodiments the electricallyinsulative charge blocking material 64 may be formed by oxidation (orother suitable chemical modification) of exposed surfaces of conductivematerial 18, and accordingly may laterally surround all of the materials66, 70 and 72 at the processing stage of FIGS. 26 and 27. Theelectrically insulative charge blocking material 64 may thus be utilizedto prevent shorting between materials 72 and 18 along sides of thecavities 60 (with the cavities 60 being shown in, for example, FIG. 14).

FIG. 29 shows a view of a fragment along the lines A-A of FIGS. 26 and27 in accordance with an example embodiment alternative to that of FIG.28; and shows that all of the charge blocking materials 64, 66 and 70may be formed to laterally surround material 72 at the processing stageof FIGS. 26 and 27. In other embodiments alternative to FIGS. 28 and 29,other configurations may be formed to have one or more of the chargeblocking materials 64, 66 and 70 laterally surrounding material 72.

FIGS. 30 and 31 show a construction at a processing stage analogous tothat of FIGS. 26 and 27, but in which the second charge-blockingmaterial 66 (which may comprise silicon nitride in some embodiments) isformed as a liner entirely along interior regions of cavities 60 (withthe cavities 60 being shown in, for example, FIG. 14). FIG. 32 shows aview of a fragment along the lines A-A of FIGS. 30 and 31 in accordancewith an example embodiment.

As discussed above with reference to FIG. 26, the memory cells 74 (onlysome of which are labeled in FIG. 26) may be ultimately incorporatedinto vertical NAND strings. For instance, in some embodiments onevertical NAND string may be comprised by the region of the stackcorresponding to the intervening region 91 (FIG. 26), and another NANDstring may be comprised by the region the stack corresponding tointervening region 93 (FIG. 26). The memory cells at each vertical levelare connected to circuitry utilized for programming and/or reading thememory cells. For instance, the control gates of the memory cells withinintervening region 91 are shown connected to circuitry 100-103, and thecontrol gates of the memory cells within intervening region 93 are shownconnected to circuitry 104-107.

The connections of the control gates to the circuitries 100-107 mayutilize any suitable landing pad structures, including, for example,so-called “shark-jaw” structures, “staircase” structures, etc. However,it can be difficult provide routing between the control gates and thelanding pad structures. A NAND array may have multiple control gates ata common vertical level sharing landing pads and circuitry. Forinstance, a third intervening region 110 of stack 16 is shown in FIG. 26to be on an opposing side of an electrically insulative pillar 80 fromthe stack 93. In some embodiments, the control gates of the memory cellswithin the third intervening region 110 will be connected to the samecircuitry 100-103 as the control gates of the memory cells within thefirst intervening region 91. Some embodiments utilize an elongatedtrench to sub-divide the stack 16 and thereby simplify routing tolanding pads and/or other circuitry.

FIG. 33 shows a construction 10 a at a processing stage analogous tothat of FIG. 4. The construction comprises a single long trench 120having linear regions 24 a-27 a in locations analogous to the locationsof trenches 24-27 of FIG. 4. The trench 120 serpentines acrossconstruction 10 a, with the linear regions 24 a-27 a being joined to oneanother through curved regions 121-123. In the shown embodiment, thelinear regions 24 a-27 a are substantially parallel to one another.

Referring to FIG. 34, the electrically insulative material 28 is formedwithin trench 120 with processing analogous to that described above withreference to FIG. 7. The electrically insulative material 28 forms asingle long panel 124 within the trench 120. Such panel comprises linearregions 134-137 within the linear regions 24 a-27 a of trench 120. Thelinear regions 134-137 are joined to one another by curved regions141-143 of the panel.

Referring to FIG. 35, the openings 50-55 are formed to extend throughthe panel 124 with processing analogous to that described above withreference to FIG. 10. In the shown embodiment, the openings are onlyformed within the linear regions 134-137 of the panel, and not withinthe curved regions 141-143.

Referring to FIG. 36, the gate dielectric material 76 and channelmaterial 78 are formed within openings 50-55 (FIG. 35), with processinganalogous to that described above with reference to FIG. 25.Accordingly, channel material posts 82 and electrically insulativepillars 80 are incorporated into a serpentining structure 147. In theshown embodiment, the channel material posts 82 are only within linearregions 134-137 of such serpentining structure.

An advantage of the embodiment of FIG. 36 is that the serpentiningstructure 147 can subdivide the NAND strings (for instance, the stringsdescribed above with reference to FIG. 26 as being within interveningregions 91, 93 and 110) into two separate groups. A first group is on aside 150 of the serpentining structure, and another group is on anopposing side 152 of the serpentining structure. The control gates onside 150 may be considered to be a first set of control gates, and thoseon side 152 may be considered to be a second set of control gates. Theintervening regions 91, 93 and 110 described above with reference toFIG. 26 are labeled in FIG. 36 to assist in understanding the describedembodiment. Intervening regions 91 and 110 are on the same side of theserpentining structure as one another (specifically, the side 150), andthe intervening region 93 is on the opposing side of the serpentiningstructure (specifically, the side 152). Thus, regions 91 and 110 may beconsidered to comprise control gates within a first set, and region 93may be considered to comprise control gates within a second set. All ofthe control gates within the first set that are at a common verticallevel may be electrically coupled to one another, and electricallycoupled to a common landing pad and/or to other common circuitry (forinstance, to the circuitry 100-103 described above with reference toFIG. 26); and all of the control gates within the second set that are ata common vertical level may be electrically coupled to one another, andelectrically coupled to a common landing pad and/or to other commoncircuitry (for instance, to the circuitry 104-107 described above withreference to FIG. 26).

The serpentining structure 147 of FIG. 36 may be one of manysubstantially identical serpentining structures formed across asemiconductor construction during fabrication of a NAND array.

Although the illustrated serpentining structure 147 has a singleelectrically insulative material 28 extending between the channelmaterial posts 78 and along the curved regions 141-143, in otherembodiments two or more electrically insulative materials may beutilized instead of the single electrically insulative material 28. Forinstance, a different electrically insulative may be utilized within thecurved regions 141-143 than within linear regions between the channelmaterial posts 82.

The NAND configurations and arrays discussed above may be incorporatedinto electronic systems. Such electronic systems may be used in, forexample, memory modules, device drivers, power modules, communicationmodems, processor modules, and application-specific modules, and mayinclude multilayer, multichip modules. The electronic systems may be anyof a broad range of systems, such as, for example, clocks, televisions,cell phones, personal computers, automobiles, industrial controlsystems, aircraft, etc.

The terms “dielectric” and “electrically insulative” are both utilizedto describe materials having insulative electrical properties. Bothterms are considered synonymous in this disclosure. The utilization ofthe term “dielectric” in some instances, and the term “electricallyinsulative” in other instances, is to provide language variation withinthis disclosure to simplify antecedent basis within the claims thatfollow, and is not utilized to indicate any significant chemical orelectrical differences.

The terms “posts” and “pillars” are both utilized to describevertically-extending structures. Both terms are considered synonymous inthis disclosure. The utilization of the term “post” in some instances,and the term “pillar” in other instances, is to provide languagevariation within this disclosure to simplify antecedent basis within theclaims that follow, and is not utilized to indicate any significantstructural differences.

The particular orientation of the various embodiments in the drawings isfor illustrative purposes only, and the embodiments may be rotatedrelative to the shown orientations in some applications. The descriptionprovided herein, and the claims that follow, pertain to any structuresthat have the described relationships between various features,regardless of whether the structures are in the particular orientationof the drawings, or are rotated relative to such orientation.

The cross-sectional views of the accompanying illustrations only showfeatures within the planes of the cross-sections, and do not showmaterials behind the planes of the cross-sections in order to simplifythe drawings.

When a structure is referred to above as being “on” or “against” anotherstructure, it can be directly on the other structure or interveningstructures may also be present. In contrast, when a structure isreferred to as being “directly on” or “directly against” anotherstructure, there are no intervening structures present. When a structureis referred to as being “connected” or “coupled” to another structure,it can be directly connected or coupled to the other structure, orintervening structures may be present. In contrast, when a structure isreferred to as being “directly connected” or “directly coupled” toanother structure, there are no intervening structures present.

Some embodiments include a method of forming vertically-stackedstructures. A stack of alternating electrically conductive levels andelectrically insulative levels is formed over a base. An electricallyinsulative panel is formed which extends through the stack. The panelhas a pair of opposing sides along the stack. Some sections of the panelare removed while other sections are left remaining. Openings are formedwhere sections of the panel are removed. Each opening has a first pairof opposing sides along the stack, and has a second pair of opposingsides along remaining sections of the panel. Cavities are formed whichextend into the electrically conductive levels along the first pair ofopposing sides of the openings. Dielectric material is formed alongexposed edges of the electrically conductive levels within the cavities.Electrically conductive material is formed within the cavities after thedielectric material is formed.

Some embodiments include a method of forming vertical NAND strings. Astack of alternating electrically conductive levels and electricallyinsulative levels is formed over a base. A trench is formed to extendthrough the stack. An electrically insulative panel is formed within thetrench. The panel has a pair of opposing sides along the stack. Somesections of the panel are removed while other sections are left toremain. Openings are formed where sections of the panel are removed.Each opening has a first pair of opposing sides along the stack, and hasa second pair of opposing sides along remaining sections of the panel.Cavities are formed to extend into the electrically conductive levelsalong the first pair of opposing sides of the openings. Charge blockingmaterial is formed along exposed edges of the electrically conductivelevels within the cavities. Charge-storage material is formed within thecavities along the charge blocking material. Gate dielectric material isformed along the charge-storage material. Channel material is formedwithin the openings and is spaced from the charge-storage material bythe gate dielectric material.

Some embodiments include a NAND construction having a stack ofalternating electrically conductive levels and electrically insulativelevels over a semiconductor base. Electrically insulative pillars extendthrough the stack. Channel material posts are between the pillars. Thechannel material posts have a first pair of opposing sides and a secondpair of opposing sides. The first pair of opposing sides is spaced fromadjacent pillars by intervening regions of the stack. None of the stackis between each of the sides of the second pair of opposing sides andpillars adjacent such sides. Cavities extend into the electricallyconductive levels along the first pair of opposing sides of the channelmaterial posts. Charge blocking material is along edges of theelectrically conductive levels within the cavities. Charge-storagematerial is within the cavities and spaced from the electricallyconductive levels by the charge blocking material. Gate dielectricmaterial is between the charge-storage material and the channel materialposts.

In compliance with the statute, the subject matter disclosed herein hasbeen described in language more or less specific as to structural andmethodical features. It is to be understood, however, that the claimsare not limited to the specific features shown and described, since themeans herein disclosed comprise example embodiments. The claims are thusto be afforded full scope as literally worded, and to be appropriatelyinterpreted in accordance with the doctrine of equivalents.

I/We claim:
 1. A method of forming vertically-stacked structures,comprising: forming a stack of alternating electrically conductivelevels and electrically insulative levels over a base; forming anelectrically insulative panel that extends through the stack; the panelhaving a pair of opposing sides along the stack; removing some sectionsof the panel while leaving other sections remaining; openings beingformed where sections of the panel are removed; each opening having afirst pair of opposing sides along the stack, and having a second pairof opposing sides along remaining sections of the panel; formingcavities extending into the electrically conductive levels along thefirst pair of opposing sides of the openings; forming dielectricmaterial along exposed edges of the electrically conductive levelswithin the cavities; and after forming the dielectric material, formingelectrically conductive material within the cavities.
 2. The method ofclaim 1 wherein a plurality of the electrically insulative panels areformed.
 3. The method of claim 2 wherein the plurality electricallyinsulative panels are configured as a plurality of substantiallyparallel panels.
 4. The method of claim 1 wherein the electricallyinsulative panel is formed to comprise a plurality of linear regionsjoined to one another through curved regions; wherein the linear regionsare substantially parallel to one another; and wherein the openings areformed only within the linear regions.
 5. The method of claim 1 whereinthe electrically insulative panel consists of silicon dioxide.
 6. Amethod of forming vertical memory strings, comprising: forming a stackof alternating electrically conductive levels and electricallyinsulative levels over a base; forming a trench extending through thestack; forming an electrically insulative panel within the trench; thepanel having a pair of opposing sides along the stack; removing somesections of the panel while leaving other sections remaining; openingsbeing formed where sections of the panel are removed; each openinghaving a first pair of opposing sides along the stack, and having asecond pair of opposing sides along remaining sections of the panel;forming cavities extending into the electrically conductive levels alongthe first pair of opposing sides of the openings; forming chargeblocking material along exposed edges of the electrically conductivelevels within the cavities; forming charge-storage material within thecavities along the charge blocking material; forming gate dielectricmaterial along the charge-storage material; and forming channel materialwithin the openings and spaced from the charge-storage material by thegate dielectric material.
 7. The method of claim 6 wherein a pluralityof the trenches are formed, and wherein a plurality of the panels areformed within said plurality of the trenches.
 8. The method of claim 7wherein the plurality of electrically insulative panels are configuredas a plurality of substantially parallel panels.
 9. The method of claim6 wherein the trench is formed to comprise a plurality of linear regionsjoined to one another through curved regions; and wherein theelectrically insulative panel formed within the trench comprises aplurality of linear regions joined to one another through curvedregions; wherein the linear regions of the panel are substantiallyparallel to one another; and wherein the openings are formed only withinthe linear regions of the panel.
 10. The method of claim 6 wherein thecharge blocking material within each cavity comprises a silicon nitridestructure sandwiched between silicon dioxide structures.
 11. The methodof claim 10 wherein the silicon nitride structure and the silicondioxide structures within each cavity are all substantially planar. 12.The method of claim 11 wherein the silicon nitride structures are formedby: forming silicon nitride within the cavities, the silicon nitridebeing along tops and bottoms of the cavities as well as along silicondioxide structures at the edges of the electrically conductive levels;forming sacrificial material within the cavities; removing the siliconnitride from the top and bottom surfaces of the cavities while thesacrificial material protects the silicon nitride along the silicondioxide structures at the edges of the electrically conductive levels;and removing the sacrificial material.
 13. The method of claim 6 whereinthe electrically conductive levels have a thickness along across-section, and wherein the charge-storage material within eachcavity has a same thickness along the cross-section as the electricallyconductive levels.
 14. A semiconductor construction, comprising: a stackof alternating electrically conductive levels and electricallyinsulative levels over a semiconductor base; electrically insulativepillars extending through the stack; channel material posts between thepillars; the channel material posts having a first pair of opposingsides and a second pair of opposing sides; the first pair of opposingsides being spaced from adjacent pillars by intervening regions of thestack; none of the stack is between each of the sides of the second pairof opposing sides and pillars adjacent such sides of the second pair;cavities extending into the electrically conductive levels along thefirst pair of opposing sides of the channel material posts; chargeblocking material along edges of the electrically conductive levelswithin the cavities; charge-storage material within the cavities andspaced from the electrically conductive levels by the charge blockingmaterial; and gate dielectric material between the charge-storagematerial and the channel material posts.
 15. The construction of claim14 wherein the charge-storage material comprises floating gate material.16. The construction of claim 14 wherein the charge-storage materialcomprises charge-trapping material.
 17. The construction of claim 14wherein the charge blocking material comprises silicon dioxide.
 18. Theconstruction of claim 14 wherein the charge blocking material withineach cavity comprises a silicon nitride structure sandwiched between apair of silicon dioxide structures.
 19. The construction of claim 18wherein the silicon nitride structure and the silicon dioxide structureswithin each cavity are all substantially planar.
 20. The construction ofclaim 14 wherein the electrically conductive levels compriseconductively doped silicon, and wherein the electrically insulativelevels comprise silicon dioxide.
 21. The construction of claim 14wherein the posts and pillars are part of a serpentining structure thatextends through the stack; the electrically conductive levels beingincorporated into vertically-stacked control gates; the serpentiningstructure separating the control gates into a first set on one side ofthe serpentining structure and a second set on an opposing side of theserpentining structure; all control gates of the first set that are at acommon vertical level are electrically coupled to one another, and allcontrol gates of the second set that are at a common vertical level areelectrically coupled to one another but not to the control gates of thefirst set.
 22. The construction of claim 21 wherein the serpentiningstructure comprises a plurality of linear regions joined to one anotherthrough curved regions; wherein the linear regions are substantiallyparallel to one another; and wherein the channel material posts are onlywithin the linear regions.
 23. The construction of claim 22 wherein thecurved regions and the pillars are a same composition as one another.24. The construction of claim 22 wherein the curved regions and thepillars both consist of silicon dioxide.
 25. The construction of claim14 wherein the channel material posts are entirely laterally surroundedby the gate dielectric material.
 26. The construction of claim 14wherein the channel material posts are spaced from the electricallyinsulative pillars by only the gate dielectric material along across-section.
 27. The construction of claim 14 wherein the channelmaterial posts are directly against the electrically insulative pillarsalong a cross-section.
 28. The construction of claim 14 wherein theelectrically insulative pillars consist of silicon dioxide.